A light-sensitive material used in processes such as photolithography and photoengraving to form a patterned coating on a surface. A substrate is coated with a light-sensitive organic material. A patterned mask is then applied to the surface to block light, so only unmasked areas are exposed. A solvent, called a developer, is then applied to the surface. In the case of a positive photoresist, the photo-sensitive material is degraded by light and the developer dissolves away exposed areas, leaving a coating where the mask was placed. In the case of a negative photoresist, the photo-sensitive material is strengthened (either polymerised or cross-linked) by light, and the developer dissolves away areas not exposed to light, leaving a coating in areas where the mask was not placed. This process is used to create surface grating images, which are the first stage in producing embossed holograms.